Office, M. E. (2021). Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. <i>Materials</i> 2021, <i>14</i>, 5472. MDPI AG.
Cita Chicago Style (17a ed.)Office, Materials Editorial. Correction: Kirste Et Al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. <i>Materials</i> 2021, <i>14</i>, 5472. MDPI AG, 2021.
Cita MLA (8a ed.)Office, Materials Editorial. Correction: Kirste Et Al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. <i>Materials</i> 2021, <i>14</i>, 5472. MDPI AG, 2021.
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