Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)

Abstract Formamidinium lead iodide (CH(NH2)2PbI3, FAPI) thin films have been deposited on glass substrates at 150 °C using ambient pressure aerosol assisted chemical vapour deposition (AACVD). The films have been analysed by a range of techniques including powder X-ray diffraction (pXRD), scanning e...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Firoz Alam, David J. Lewis
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2020
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/dd8e438313ec4f8fafd2535aa12d182a
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:dd8e438313ec4f8fafd2535aa12d182a
record_format	dspace
spelling	oai:doaj.org-article:dd8e438313ec4f8fafd2535aa12d182a2021-12-02T12:42:18ZThin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)10.1038/s41598-020-79291-12045-2322https://doaj.org/article/dd8e438313ec4f8fafd2535aa12d182a2020-12-01T00:00:00Zhttps://doi.org/10.1038/s41598-020-79291-1https://doaj.org/toc/2045-2322Abstract Formamidinium lead iodide (CH(NH2)2PbI3, FAPI) thin films have been deposited on glass substrates at 150 °C using ambient pressure aerosol assisted chemical vapour deposition (AACVD). The films have been analysed by a range of techniques including powder X-ray diffraction (pXRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, and UV–Vis–NIR absorption spectroscopy. Sharp reflections in the pXRD pattern can be indexed to the α-phase of FAPI which confirms the crystallinity of the as-deposited film and reveals a preferred growth orientation along the (002) plane with respect to the substrate. High magnification SEM images show that the thin film is comprised of a network of intimately connected FAPI crystallites which form a mesoporous architecture. EDX mapping of lead and iodine emission peaks show that the Pb and I within these films are spatially co-localised. Optical measurements show as-deposited FAPI films have absorption onsets in the near infra-red with a direct bandgap value of 1.46 eV, suitable for single junction solar cells. Four-point probe measurement of as deposited films show that the electrical conductivity (σ) of the FAPI thin film is 5.2 × 10–7 S/cm, which is similar to FAPI thin films deposited by spin coating technique.Firoz AlamDavid J. LewisNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 10, Iss 1, Pp 1-7 (2020)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Firoz Alam David J. Lewis Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)
description	Abstract Formamidinium lead iodide (CH(NH2)2PbI3, FAPI) thin films have been deposited on glass substrates at 150 °C using ambient pressure aerosol assisted chemical vapour deposition (AACVD). The films have been analysed by a range of techniques including powder X-ray diffraction (pXRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, and UV–Vis–NIR absorption spectroscopy. Sharp reflections in the pXRD pattern can be indexed to the α-phase of FAPI which confirms the crystallinity of the as-deposited film and reveals a preferred growth orientation along the (002) plane with respect to the substrate. High magnification SEM images show that the thin film is comprised of a network of intimately connected FAPI crystallites which form a mesoporous architecture. EDX mapping of lead and iodine emission peaks show that the Pb and I within these films are spatially co-localised. Optical measurements show as-deposited FAPI films have absorption onsets in the near infra-red with a direct bandgap value of 1.46 eV, suitable for single junction solar cells. Four-point probe measurement of as deposited films show that the electrical conductivity (σ) of the FAPI thin film is 5.2 × 10–7 S/cm, which is similar to FAPI thin films deposited by spin coating technique.
format	article
author	Firoz Alam David J. Lewis
author_facet	Firoz Alam David J. Lewis
author_sort	Firoz Alam
title	Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)
title_short	Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)
title_full	Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)
title_fullStr	Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)
title_full_unstemmed	Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)
title_sort	thin films of formamidinium lead iodide (fapi) deposited using aerosol assisted chemical vapour deposition (aacvd)
publisher	Nature Portfolio
publishDate	2020
url	https://doaj.org/article/dd8e438313ec4f8fafd2535aa12d182a
work_keys_str_mv	AT firozalam thinfilmsofformamidiniumleadiodidefapidepositedusingaerosolassistedchemicalvapourdepositionaacvd AT davidjlewis thinfilmsofformamidiniumleadiodidefapidepositedusingaerosolassistedchemicalvapourdepositionaacvd
_version_	1718393713009360896

Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)

Ejemplares similares