Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging

Controlled preparation of few-layer graphene is a promising, yet challenging technological protocol. Here, the authors perform real-time imaging during chemical vapour deposition growth and hydrogen etching, to gain insight into layer-dependent growth mechanisms and graphene-substrate interaction.

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Detalles Bibliográficos
Autores principales: Zhu-Jun Wang, Jichen Dong, Yi Cui, Gyula Eres, Olaf Timpe, Qiang Fu, Feng Ding, R. Schloegl, Marc-Georg Willinger
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2016
Materias:
Q
Acceso en línea:https://doaj.org/article/deba96c459e1494b9dbb6d1322908fa0
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