Friction Characteristics of Amorphous Carbon Films on Rubber Deposited by Cold Atmospheric Pressure Plasma
Hydrogenated amorphous carbon (a-C:H) films were deposited on rubber surface by plasma-enhanced chemical vapor deposition (CVD), using a non-equilibrium atmospheric pressure plasma torch. The effects of oxygen, in the deposition atmosphere, on the chemical and mechanical characteristics of a-C:H fil...
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| Autores principales: | , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Japanese Society of Tribologists
2012
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/e37a17e8bd3742878da6923341dcd76b |
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| Sumario: | Hydrogenated amorphous carbon (a-C:H) films were deposited on rubber surface by plasma-enhanced chemical vapor deposition (CVD), using a non-equilibrium atmospheric pressure plasma torch. The effects of oxygen, in the deposition atmosphere, on the chemical and mechanical characteristics of a-C:H films were investigated. It was clarified that the amount of carbon atoms combined with oxygen atoms in the a-C:H films increased with the increase of the oxygen content in the deposition atmosphere. On the other hand, surface hardness decreased as the oxygen content increased. As a result, a very low frictional property of a-C:H films was achieved by CVD, using the non-equilibrium atmospheric pressure plasma torch with eliminating oxygen from the deposition atmosphere. |
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