Emitter doping influence on electrical performance of C-Si cells under concentrated light
In the present work we have investigated the influence of the emitter doping on the cell performance of c-Si devices at one sun and under concentrated light. We have realized different devices using FZ p-type Boron doped wafers and varying the sheet resistance of the emitters aiming at analyzing the...
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D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2007
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oai:doaj.org-article:e386c45cdc3542a09789d63a3f2509702021-11-21T12:08:18ZEmitter doping influence on electrical performance of C-Si cells under concentrated light 2537-63651810-648Xhttps://doaj.org/article/e386c45cdc3542a09789d63a3f2509702007-05-01T00:00:00Zhttps://mjps.nanotech.md/archive/2007/article/3729https://doaj.org/toc/1810-648Xhttps://doaj.org/toc/2537-6365In the present work we have investigated the influence of the emitter doping on the cell performance of c-Si devices at one sun and under concentrated light. We have realized different devices using FZ p-type Boron doped wafers and varying the sheet resistance of the emitters aiming at analyzing the effects of junction depth and concentration on the surface of doped elements affecting the recombination process. We made a comparative study of the electrical behaviour of different devices (current-voltage and quantum efficiency characterization) at one sun and under concentrated light. The best result achieved is η > 19% at 100 suns.Bobeico, EugeniaMorvillo, PD.Ghitu Institute of Electronic Engineering and NanotechnologiesarticlePhysicsQC1-999ElectronicsTK7800-8360ENMoldavian Journal of the Physical Sciences, Vol 6, Iss 2, Pp 245-249 (2007) |
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Physics QC1-999 Electronics TK7800-8360 |
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Physics QC1-999 Electronics TK7800-8360 Bobeico, Eugenia Morvillo, P Emitter doping influence on electrical performance of C-Si cells under concentrated light |
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In the present work we have investigated the influence of the emitter doping on the cell performance of c-Si devices at one sun and under concentrated light. We have realized different devices using FZ p-type Boron doped wafers and varying the sheet resistance of the emitters aiming at analyzing the effects of junction depth and concentration on the surface of doped elements affecting the recombination process. We made a comparative study of the electrical behaviour of different devices (current-voltage and quantum efficiency characterization) at one sun and under concentrated light. The best result achieved is η > 19% at 100 suns. |
format |
article |
author |
Bobeico, Eugenia Morvillo, P |
author_facet |
Bobeico, Eugenia Morvillo, P |
author_sort |
Bobeico, Eugenia |
title |
Emitter doping influence on electrical performance of C-Si cells under concentrated light
|
title_short |
Emitter doping influence on electrical performance of C-Si cells under concentrated light
|
title_full |
Emitter doping influence on electrical performance of C-Si cells under concentrated light
|
title_fullStr |
Emitter doping influence on electrical performance of C-Si cells under concentrated light
|
title_full_unstemmed |
Emitter doping influence on electrical performance of C-Si cells under concentrated light
|
title_sort |
emitter doping influence on electrical performance of c-si cells under concentrated light |
publisher |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies |
publishDate |
2007 |
url |
https://doaj.org/article/e386c45cdc3542a09789d63a3f250970 |
work_keys_str_mv |
AT bobeicoeugenia emitterdopinginfluenceonelectricalperformanceofcsicellsunderconcentratedlight AT morvillop emitterdopinginfluenceonelectricalperformanceofcsicellsunderconcentratedlight |
_version_ |
1718419216647847936 |