Etching-assisted femtosecond laser modification of hard materials

With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Liu Xue-Qing, Bai Ben-Feng, Chen Qi-Dai, Sun Hong-Bo
Formato: article
Lenguaje:EN
Publicado: Institue of Optics and Electronics, Chinese Academy of Sciences 2019
Materias:
Acceso en línea:https://doaj.org/article/e55fb61ced344c9d86ad8acb2d9079e2
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
Descripción
Sumario:With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard materials. However, the low efficiency, low precision and high surface roughness are the main stumbling blocks for femtosecond laser processing of hard materials. So far, etching-assisted femtosecond laser modification has demonstrated to be the efficient strategy to solve the above problems when processing hard materials, including wet etching and dry etching. In this review, femtosecond laser modification that would influence the etching selectivity is introduced. The fundamental and recent applications of the two kinds of etching assisted femtosecond laser modification technologies are summarized. In addition, the challenges and application prospects of these technologies are discussed.