Etching-assisted femtosecond laser modification of hard materials

With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard...

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Autores principales:	Liu Xue-Qing, Bai Ben-Feng, Chen Qi-Dai, Sun Hong-Bo
Formato:	article
Lenguaje:	EN
Publicado:	Institue of Optics and Electronics, Chinese Academy of Sciences 2019
Materias:	femtosecond laser hard materials wet etching dry etching Optics. Light QC350-467
Acceso en línea:	https://doaj.org/article/e55fb61ced344c9d86ad8acb2d9079e2
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id	oai:doaj.org-article:e55fb61ced344c9d86ad8acb2d9079e2
record_format	dspace
spelling	oai:doaj.org-article:e55fb61ced344c9d86ad8acb2d9079e22021-11-11T09:53:06ZEtching-assisted femtosecond laser modification of hard materials2096-457910.29026/oea.2019.190021https://doaj.org/article/e55fb61ced344c9d86ad8acb2d9079e22019-09-01T00:00:00Zhttp://www.oejournal.org/article/doi/10.29026/oea.2019.190021https://doaj.org/toc/2096-4579With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard materials. However, the low efficiency, low precision and high surface roughness are the main stumbling blocks for femtosecond laser processing of hard materials. So far, etching-assisted femtosecond laser modification has demonstrated to be the efficient strategy to solve the above problems when processing hard materials, including wet etching and dry etching. In this review, femtosecond laser modification that would influence the etching selectivity is introduced. The fundamental and recent applications of the two kinds of etching assisted femtosecond laser modification technologies are summarized. In addition, the challenges and application prospects of these technologies are discussed.Liu Xue-QingBai Ben-FengChen Qi-DaiSun Hong-BoInstitue of Optics and Electronics, Chinese Academy of Sciencesarticlefemtosecond laserhard materialswet etchingdry etchingOptics. LightQC350-467ENOpto-Electronic Advances, Vol 2, Iss 9, Pp 190021-1-190021-14 (2019)
institution	DOAJ
collection	DOAJ
language	EN
topic	femtosecond laser hard materials wet etching dry etching Optics. Light QC350-467
spellingShingle	femtosecond laser hard materials wet etching dry etching Optics. Light QC350-467 Liu Xue-Qing Bai Ben-Feng Chen Qi-Dai Sun Hong-Bo Etching-assisted femtosecond laser modification of hard materials
description	With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard materials. However, the low efficiency, low precision and high surface roughness are the main stumbling blocks for femtosecond laser processing of hard materials. So far, etching-assisted femtosecond laser modification has demonstrated to be the efficient strategy to solve the above problems when processing hard materials, including wet etching and dry etching. In this review, femtosecond laser modification that would influence the etching selectivity is introduced. The fundamental and recent applications of the two kinds of etching assisted femtosecond laser modification technologies are summarized. In addition, the challenges and application prospects of these technologies are discussed.
format	article
author	Liu Xue-Qing Bai Ben-Feng Chen Qi-Dai Sun Hong-Bo
author_facet	Liu Xue-Qing Bai Ben-Feng Chen Qi-Dai Sun Hong-Bo
author_sort	Liu Xue-Qing
title	Etching-assisted femtosecond laser modification of hard materials
title_short	Etching-assisted femtosecond laser modification of hard materials
title_full	Etching-assisted femtosecond laser modification of hard materials
title_fullStr	Etching-assisted femtosecond laser modification of hard materials
title_full_unstemmed	Etching-assisted femtosecond laser modification of hard materials
title_sort	etching-assisted femtosecond laser modification of hard materials
publisher	Institue of Optics and Electronics, Chinese Academy of Sciences
publishDate	2019
url	https://doaj.org/article/e55fb61ced344c9d86ad8acb2d9079e2
work_keys_str_mv	AT liuxueqing etchingassistedfemtosecondlasermodificationofhardmaterials AT baibenfeng etchingassistedfemtosecondlasermodificationofhardmaterials AT chenqidai etchingassistedfemtosecondlasermodificationofhardmaterials AT sunhongbo etchingassistedfemtosecondlasermodificationofhardmaterials
_version_	1718439268944183296

Etching-assisted femtosecond laser modification of hard materials

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