Statistical insights into the reaction of fluorine atoms with silicon

Abstract The dependences of silicon etching rate on the concentration of F atoms are investigated theoretically. The nonlinear regression analysis of the experimental data indicates that the reaction of F atoms with silicon is 2nd overall order reaction. The relationship between overall reaction ord...

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Autor principal: Rimantas Knizikevičius
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2020
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Acceso en línea:https://doaj.org/article/e75885a6a297439392bf5a2ee4dc396f
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