Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption

Abstract Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, beca...

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Autores principales:	Ji-Young Jeong, Je-Ryung Lee, Hyeonjin Park, Joonkyo Jung, Doo-Sun Choi, Eun-chae Jeon, Jonghwa Shin, Jun Sae Han, Tae-Jin Je
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/ee28a9b9084f4ee699862156407c6b75
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spelling	oai:doaj.org-article:ee28a9b9084f4ee699862156407c6b752021-12-02T17:41:04ZFabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption10.1038/s41598-021-91868-y2045-2322https://doaj.org/article/ee28a9b9084f4ee699862156407c6b752021-06-01T00:00:00Zhttps://doi.org/10.1038/s41598-021-91868-yhttps://doaj.org/toc/2045-2322Abstract Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than − 10 dB in the frequency band range of 8.0–14.6 GHz.Ji-Young JeongJe-Ryung LeeHyeonjin ParkJoonkyo JungDoo-Sun ChoiEun-chae JeonJonghwa ShinJun Sae HanTae-Jin JeNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 11, Iss 1, Pp 1-12 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Ji-Young Jeong Je-Ryung Lee Hyeonjin Park Joonkyo Jung Doo-Sun Choi Eun-chae Jeon Jonghwa Shin Jun Sae Han Tae-Jin Je Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
description	Abstract Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than − 10 dB in the frequency band range of 8.0–14.6 GHz.
format	article
author	Ji-Young Jeong Je-Ryung Lee Hyeonjin Park Joonkyo Jung Doo-Sun Choi Eun-chae Jeon Jonghwa Shin Jun Sae Han Tae-Jin Je
author_facet	Ji-Young Jeong Je-Ryung Lee Hyeonjin Park Joonkyo Jung Doo-Sun Choi Eun-chae Jeon Jonghwa Shin Jun Sae Han Tae-Jin Je
author_sort	Ji-Young Jeong
title	Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
title_short	Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
title_full	Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
title_fullStr	Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
title_full_unstemmed	Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
title_sort	fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/ee28a9b9084f4ee699862156407c6b75
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Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption

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