Zhao, Z., Zhou, Y., Zhu, H., Sun, Q., & Zhang, D. W. (2021). Gate Oxide and Implantation Process Co-Optimization for Low-Power MCU Applications. IEEE.
Style de citation Chicago (17e éd.)Zhao, Zijian, Yao Zhou, Hao Zhu, Qingqing Sun, et David Wei Zhang. Gate Oxide and Implantation Process Co-Optimization for Low-Power MCU Applications. IEEE, 2021.
Style de citation MLA (8e éd.)Zhao, Zijian, et al. Gate Oxide and Implantation Process Co-Optimization for Low-Power MCU Applications. IEEE, 2021.
Attention : ces citations peuvent ne pas être correctes à 100%.