Recent progress of oxide-TFT-based inverter technology
Oxide semiconductor-based thin-film transistor (oxide-TFT) technology have gained significant attention since the innovation of n-channel oxide-TFT using ZnO and amorphous In–Ga–Zn–O (a-IGZO) channels because of their superior device properties including excellent electrical property such as high TF...
Guardado en:
Autor principal: | |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
Taylor & Francis Group
2021
|
Materias: | |
Acceso en línea: | https://doaj.org/article/f208476351384cce9f84da873cf76437 |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
id |
oai:doaj.org-article:f208476351384cce9f84da873cf76437 |
---|---|
record_format |
dspace |
spelling |
oai:doaj.org-article:f208476351384cce9f84da873cf764372021-11-26T11:19:47ZRecent progress of oxide-TFT-based inverter technology1598-03162158-160610.1080/15980316.2021.1977401https://doaj.org/article/f208476351384cce9f84da873cf764372021-10-01T00:00:00Zhttp://dx.doi.org/10.1080/15980316.2021.1977401https://doaj.org/toc/1598-0316https://doaj.org/toc/2158-1606Oxide semiconductor-based thin-film transistor (oxide-TFT) technology have gained significant attention since the innovation of n-channel oxide-TFT using ZnO and amorphous In–Ga–Zn–O (a-IGZO) channels because of their superior device properties including excellent electrical property such as high TFT mobility over >10 cm2/Vs and the low-cost manufacturability originating from the low-temperature processability. Already, n-channel a-IGZO-TFT is widely employed as a TFT pixel switching backplane for several high-performance active-matrix flat-panel displays, and oxide-TFT technology to date is well acknowledged as the best TFT technology for future device applications in the wide range area of electronics such as sensors, Internet of things (IoT), energy-harvesting, medical/bio-interface device, etc. Therefore, the development of large-scale circuit beyond discrete TFT device level becomes increasingly important and is vital to advance the next stage of oxide-TFT technology. In particular, developing oxide-TFT-based inverter device technology is the key for developing several digital and analog circuits. In this paper, the recent progress and challenges in oxide-TFT-based inverter technology, including unipolar NMOS, PMOS, CMOS, and CMOS-like inverters using ambipolar oxide-TFT, are reviewed.Kenji NomuraTaylor & Francis Grouparticleoxidethin-film transistors (tfts)invertercmosp-channel tftring oscillatorComputer engineering. Computer hardwareTK7885-7895ENJournal of Information Display, Vol 22, Iss 4, Pp 211-229 (2021) |
institution |
DOAJ |
collection |
DOAJ |
language |
EN |
topic |
oxide thin-film transistors (tfts) inverter cmos p-channel tft ring oscillator Computer engineering. Computer hardware TK7885-7895 |
spellingShingle |
oxide thin-film transistors (tfts) inverter cmos p-channel tft ring oscillator Computer engineering. Computer hardware TK7885-7895 Kenji Nomura Recent progress of oxide-TFT-based inverter technology |
description |
Oxide semiconductor-based thin-film transistor (oxide-TFT) technology have gained significant attention since the innovation of n-channel oxide-TFT using ZnO and amorphous In–Ga–Zn–O (a-IGZO) channels because of their superior device properties including excellent electrical property such as high TFT mobility over >10 cm2/Vs and the low-cost manufacturability originating from the low-temperature processability. Already, n-channel a-IGZO-TFT is widely employed as a TFT pixel switching backplane for several high-performance active-matrix flat-panel displays, and oxide-TFT technology to date is well acknowledged as the best TFT technology for future device applications in the wide range area of electronics such as sensors, Internet of things (IoT), energy-harvesting, medical/bio-interface device, etc. Therefore, the development of large-scale circuit beyond discrete TFT device level becomes increasingly important and is vital to advance the next stage of oxide-TFT technology. In particular, developing oxide-TFT-based inverter device technology is the key for developing several digital and analog circuits. In this paper, the recent progress and challenges in oxide-TFT-based inverter technology, including unipolar NMOS, PMOS, CMOS, and CMOS-like inverters using ambipolar oxide-TFT, are reviewed. |
format |
article |
author |
Kenji Nomura |
author_facet |
Kenji Nomura |
author_sort |
Kenji Nomura |
title |
Recent progress of oxide-TFT-based inverter technology |
title_short |
Recent progress of oxide-TFT-based inverter technology |
title_full |
Recent progress of oxide-TFT-based inverter technology |
title_fullStr |
Recent progress of oxide-TFT-based inverter technology |
title_full_unstemmed |
Recent progress of oxide-TFT-based inverter technology |
title_sort |
recent progress of oxide-tft-based inverter technology |
publisher |
Taylor & Francis Group |
publishDate |
2021 |
url |
https://doaj.org/article/f208476351384cce9f84da873cf76437 |
work_keys_str_mv |
AT kenjinomura recentprogressofoxidetftbasedinvertertechnology |
_version_ |
1718409570545565696 |