Selective etching of 10 MHz repetition rate fs-laser inscribed tracks in YAG
We investigated fs-laser structuring of YAG crystals at high writing velocities up to 100 mm/s using a commercial 10 MHz fs-laser system supplied by Coherent Inc. and selective etching of these structures for fabrication of ultrahigh aspect ratio microchannels. Usage of a diluted acid mixture of 22%...
Enregistré dans:
Auteurs principaux: | Hasse Kore, Kip Detlef, Kränkel Christian |
---|---|
Format: | article |
Langue: | EN |
Publié: |
EDP Sciences
2021
|
Sujets: | |
Accès en ligne: | https://doaj.org/article/f67cc3a1209e49ce9e2888c6581c73a5 |
Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
Documents similaires
-
Efficient watt-level 0.775 μm SHG and 3.3 μm DFG in annealed and reverse proton exchanged diced PPLN ridge waveguides
par: Suntsov Sergiy, et autres
Publié: (2021) -
Real-Time Data Acquisition and Processing System for MHz Repetition Rate Image Sensors
par: Aleksander Mielczarek, et autres
Publié: (2021) -
Multiplexed fiber-optic Fabry-Pérot cavities for refractive index and temperature sensing fabricated using diamond-blade dicing
par: Pfalzgraf Ivonne, et autres
Publié: (2021) -
High-flux ultrafast extreme-ultraviolet photoemission spectroscopy at 18.4 MHz pulse repetition rate
par: T. Saule, et autres
Publié: (2019) -
Evaluation of Nd:YAG Laser Capsulotomy Rates in a Real-Life Population
par: Ling R, et autres
Publié: (2020)