Cita APA (7a ed.)

Park, H., Lee, J., Han, G., AlMutairi, A., Kim, Y., Lee, J., . . . Kim, S. (2021). Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors. Nature Portfolio.

Cita Chicago Style (17a ed.)

Park, Heekyeong, et al. Nano-patterning on Multilayer MoS2 via Block Copolymer Lithography for Highly Sensitive and Responsive Phototransistors. Nature Portfolio, 2021.

Cita MLA (8a ed.)

Park, Heekyeong, et al. Nano-patterning on Multilayer MoS2 via Block Copolymer Lithography for Highly Sensitive and Responsive Phototransistors. Nature Portfolio, 2021.

Precaución: Estas citas no son 100% exactas.