Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition

Abstract We investigated the nucleation and grain growth of graphene grown on Cu through radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD) at different temperatures. A reasonable shielding method for the placement of copper was employed to achieve graphene by RF-PECVD. The nucleat...

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Autores principales:	Na Li, Zhen Zhen, Rujing Zhang, Zhenhua Xu, Zhen Zheng, Limin He
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/fa16effb2cdc4a30b0590e3bec50478d
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spelling	oai:doaj.org-article:fa16effb2cdc4a30b0590e3bec50478d2021-12-02T17:05:46ZNucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition10.1038/s41598-021-85537-32045-2322https://doaj.org/article/fa16effb2cdc4a30b0590e3bec50478d2021-03-01T00:00:00Zhttps://doi.org/10.1038/s41598-021-85537-3https://doaj.org/toc/2045-2322Abstract We investigated the nucleation and grain growth of graphene grown on Cu through radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD) at different temperatures. A reasonable shielding method for the placement of copper was employed to achieve graphene by RF-PECVD. The nucleation and growth of graphene grains during PECVD were strongly temperature dependent. A high growth temperature facilitated the growth of polycrystalline graphene grains with a large size (~ 2 μm), whereas low temperature induced the formation of nanocrystalline grains. At a moderate temperature (790 to 850 °C), both nanocrystalline and micron-scale polycrystalline graphene grew simultaneously on Cu within 60 s with 50 W RF plasma power. As the growth time increased, the large graphene grains preferentially nucleated and grew rapidly, followed by the nucleation and growth of nanograins. There was competition between the growth of the two grain sizes. In addition, a model of graphene nucleation and grain growth during PECVD at different temperatures was established.Na LiZhen ZhenRujing ZhangZhenhua XuZhen ZhengLimin HeNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Na Li Zhen Zhen Rujing Zhang Zhenhua Xu Zhen Zheng Limin He Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition
description	Abstract We investigated the nucleation and grain growth of graphene grown on Cu through radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD) at different temperatures. A reasonable shielding method for the placement of copper was employed to achieve graphene by RF-PECVD. The nucleation and growth of graphene grains during PECVD were strongly temperature dependent. A high growth temperature facilitated the growth of polycrystalline graphene grains with a large size (~ 2 μm), whereas low temperature induced the formation of nanocrystalline grains. At a moderate temperature (790 to 850 °C), both nanocrystalline and micron-scale polycrystalline graphene grew simultaneously on Cu within 60 s with 50 W RF plasma power. As the growth time increased, the large graphene grains preferentially nucleated and grew rapidly, followed by the nucleation and growth of nanograins. There was competition between the growth of the two grain sizes. In addition, a model of graphene nucleation and grain growth during PECVD at different temperatures was established.
format	article
author	Na Li Zhen Zhen Rujing Zhang Zhenhua Xu Zhen Zheng Limin He
author_facet	Na Li Zhen Zhen Rujing Zhang Zhenhua Xu Zhen Zheng Limin He
author_sort	Na Li
title	Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition
title_short	Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition
title_full	Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition
title_fullStr	Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition
title_full_unstemmed	Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition
title_sort	nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/fa16effb2cdc4a30b0590e3bec50478d
work_keys_str_mv	AT nali nucleationandgrowthdynamicsofgraphenegrownbyradiofrequencyplasmaenhancedchemicalvapordeposition AT zhenzhen nucleationandgrowthdynamicsofgraphenegrownbyradiofrequencyplasmaenhancedchemicalvapordeposition AT rujingzhang nucleationandgrowthdynamicsofgraphenegrownbyradiofrequencyplasmaenhancedchemicalvapordeposition AT zhenhuaxu nucleationandgrowthdynamicsofgraphenegrownbyradiofrequencyplasmaenhancedchemicalvapordeposition AT zhenzheng nucleationandgrowthdynamicsofgraphenegrownbyradiofrequencyplasmaenhancedchemicalvapordeposition AT liminhe nucleationandgrowthdynamicsofgraphenegrownbyradiofrequencyplasmaenhancedchemicalvapordeposition
_version_	1718381827734896640

Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition

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