Peng, W., Mun, J., Xie, Q., Chen, J., Wang, L., Kim, M., & Noh, T. W. (2021). Oxygen vacancy-induced topological nanodomains in ultrathin ferroelectric films. Nature Portfolio.
Cita Chicago Style (17a ed.)Peng, Wei, Junsik Mun, Qidong Xie, Jingsheng Chen, Lingfei Wang, Miyoung Kim, y Tae Won Noh. Oxygen Vacancy-induced Topological Nanodomains in Ultrathin Ferroelectric Films. Nature Portfolio, 2021.
Cita MLA (8a ed.)Peng, Wei, et al. Oxygen Vacancy-induced Topological Nanodomains in Ultrathin Ferroelectric Films. Nature Portfolio, 2021.
Precaución: Estas citas no son 100% exactas.