Structural optimization of silicon thin film for thermoelectric materials

Abstract The method to optimize nanostructures of silicon thin films as thermoelectric materials is developed. The simulated annealing method is utilized for predicting the optimized structure. The mean free path and thermal conductivity of thin films, which are the objective function of optimizatio...

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Autor principal:	Takuma Hori
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/fa1a897f237345d49b460e8277d9770c
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spelling	oai:doaj.org-article:fa1a897f237345d49b460e8277d9770c2021-11-28T12:19:20ZStructural optimization of silicon thin film for thermoelectric materials10.1038/s41598-021-01855-62045-2322https://doaj.org/article/fa1a897f237345d49b460e8277d9770c2021-11-01T00:00:00Zhttps://doi.org/10.1038/s41598-021-01855-6https://doaj.org/toc/2045-2322Abstract The method to optimize nanostructures of silicon thin films as thermoelectric materials is developed. The simulated annealing method is utilized for predicting the optimized structure. The mean free path and thermal conductivity of thin films, which are the objective function of optimization, is evaluated by using phonon transport simulations and lattice dynamics calculations. In small systems composed of square lattices, the simulated annealing method successfully predicts optimized structure corroborated by an exhaustive search. This fact indicates that the simulated annealing method is an effective tool for optimizing nanostructured thin films as thermoelectric materials.Takuma HoriNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 11, Iss 1, Pp 1-9 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Takuma Hori Structural optimization of silicon thin film for thermoelectric materials
description	Abstract The method to optimize nanostructures of silicon thin films as thermoelectric materials is developed. The simulated annealing method is utilized for predicting the optimized structure. The mean free path and thermal conductivity of thin films, which are the objective function of optimization, is evaluated by using phonon transport simulations and lattice dynamics calculations. In small systems composed of square lattices, the simulated annealing method successfully predicts optimized structure corroborated by an exhaustive search. This fact indicates that the simulated annealing method is an effective tool for optimizing nanostructured thin films as thermoelectric materials.
format	article
author	Takuma Hori
author_facet	Takuma Hori
author_sort	Takuma Hori
title	Structural optimization of silicon thin film for thermoelectric materials
title_short	Structural optimization of silicon thin film for thermoelectric materials
title_full	Structural optimization of silicon thin film for thermoelectric materials
title_fullStr	Structural optimization of silicon thin film for thermoelectric materials
title_full_unstemmed	Structural optimization of silicon thin film for thermoelectric materials
title_sort	structural optimization of silicon thin film for thermoelectric materials
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/fa1a897f237345d49b460e8277d9770c
work_keys_str_mv	AT takumahori structuraloptimizationofsiliconthinfilmforthermoelectricmaterials
_version_	1718408116044824576

Structural optimization of silicon thin film for thermoelectric materials

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