Structural optimization of silicon thin film for thermoelectric materials
Abstract The method to optimize nanostructures of silicon thin films as thermoelectric materials is developed. The simulated annealing method is utilized for predicting the optimized structure. The mean free path and thermal conductivity of thin films, which are the objective function of optimizatio...
Enregistré dans:
| Auteur principal: | |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2021
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/fa1a897f237345d49b460e8277d9770c |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|