Structural optimization of silicon thin film for thermoelectric materials
Abstract The method to optimize nanostructures of silicon thin films as thermoelectric materials is developed. The simulated annealing method is utilized for predicting the optimized structure. The mean free path and thermal conductivity of thin films, which are the objective function of optimizatio...
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| Formato: | article |
| Lenguaje: | EN |
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Nature Portfolio
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/fa1a897f237345d49b460e8277d9770c |
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