Layer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application

Abstract As the downscaling of electronic devices continues, the problems of leakage currents and heat dissipation become more and more serious. To address these issues, new materials and new structures are explored. Here, we propose an interesting heterostructure made of ultrathin SnO layers on Si(...

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Autores principales: Chengcheng Xiao, Fang Wang, Yao Wang, Shengyuan A. Yang, Jianzhong Jiang, Ming Yang, Yunhao Lu, Shijie Wang, Yuanping Feng
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Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/fa3a69bc665d4590a5b4aff6a3cf9c34
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spelling oai:doaj.org-article:fa3a69bc665d4590a5b4aff6a3cf9c342021-12-02T11:52:26ZLayer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application10.1038/s41598-017-02832-82045-2322https://doaj.org/article/fa3a69bc665d4590a5b4aff6a3cf9c342017-05-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-02832-8https://doaj.org/toc/2045-2322Abstract As the downscaling of electronic devices continues, the problems of leakage currents and heat dissipation become more and more serious. To address these issues, new materials and new structures are explored. Here, we propose an interesting heterostructure made of ultrathin SnO layers on Si(001) surface. Our first-principle calculations show that a single layer of SnO on Si(001) surface is a semiconductor, but a bilayer SnO on the same surface is metallic. This metal-semiconductor dichotomy allows construction of single-2D-material-based electronic devices with low contact resistance and low leakage currents. In particular, due to the interaction between Sn and the Si substrate, the semiconducting monolayer-SnO/Si(001) has a highly anisotropic band structure with a much lighter hole effective mass along one direction than that of Si and most other 2D materials, indicating a high carrier mobility. Furthermore, by combining density functional theory and nonequilibrium Green’s function method, we directly investigate the transport characteristics of a field effect transistor based on the proposed heterostructures, which shows very low contact resistance, negligible leakage current, and easy gate control at a compact channel length.Chengcheng XiaoFang WangYao WangShengyuan A. YangJianzhong JiangMing YangYunhao LuShijie WangYuanping FengNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-9 (2017)
institution DOAJ
collection DOAJ
language EN
topic Medicine
R
Science
Q
spellingShingle Medicine
R
Science
Q
Chengcheng Xiao
Fang Wang
Yao Wang
Shengyuan A. Yang
Jianzhong Jiang
Ming Yang
Yunhao Lu
Shijie Wang
Yuanping Feng
Layer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application
description Abstract As the downscaling of electronic devices continues, the problems of leakage currents and heat dissipation become more and more serious. To address these issues, new materials and new structures are explored. Here, we propose an interesting heterostructure made of ultrathin SnO layers on Si(001) surface. Our first-principle calculations show that a single layer of SnO on Si(001) surface is a semiconductor, but a bilayer SnO on the same surface is metallic. This metal-semiconductor dichotomy allows construction of single-2D-material-based electronic devices with low contact resistance and low leakage currents. In particular, due to the interaction between Sn and the Si substrate, the semiconducting monolayer-SnO/Si(001) has a highly anisotropic band structure with a much lighter hole effective mass along one direction than that of Si and most other 2D materials, indicating a high carrier mobility. Furthermore, by combining density functional theory and nonequilibrium Green’s function method, we directly investigate the transport characteristics of a field effect transistor based on the proposed heterostructures, which shows very low contact resistance, negligible leakage current, and easy gate control at a compact channel length.
format article
author Chengcheng Xiao
Fang Wang
Yao Wang
Shengyuan A. Yang
Jianzhong Jiang
Ming Yang
Yunhao Lu
Shijie Wang
Yuanping Feng
author_facet Chengcheng Xiao
Fang Wang
Yao Wang
Shengyuan A. Yang
Jianzhong Jiang
Ming Yang
Yunhao Lu
Shijie Wang
Yuanping Feng
author_sort Chengcheng Xiao
title Layer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application
title_short Layer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application
title_full Layer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application
title_fullStr Layer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application
title_full_unstemmed Layer-dependent semiconductor-metal transition of SnO/Si(001) heterostructure and device application
title_sort layer-dependent semiconductor-metal transition of sno/si(001) heterostructure and device application
publisher Nature Portfolio
publishDate 2017
url https://doaj.org/article/fa3a69bc665d4590a5b4aff6a3cf9c34
work_keys_str_mv AT chengchengxiao layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT fangwang layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT yaowang layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT shengyuanayang layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT jianzhongjiang layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT mingyang layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT yunhaolu layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT shijiewang layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
AT yuanpingfeng layerdependentsemiconductormetaltransitionofsnosi001heterostructureanddeviceapplication
_version_ 1718395082782015488