Multi-Wavelength Optical Patterning for Multiscale Materials Design

Laser interferometry is a consolidated technique for materials structuring, enabling single step and large area patterning. Here we report the investigation of the morphological modification encoded on a thin film of a photosensitive material by the light interference pattern obtained from a laser o...

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Autores principales:	Biagio Audia, Pasquale Pagliusi, Alfredo Mazzulla, Gabriella Cipparrone
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	holographic patterning photoresponsive materials surface relief grating (SRG) azobenzene Applied optics. Photonics TA1501-1820
Acceso en línea:	https://doaj.org/article/fec36560db2f4f3ea68b8532f80594b3
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id	oai:doaj.org-article:fec36560db2f4f3ea68b8532f80594b3
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spelling	oai:doaj.org-article:fec36560db2f4f3ea68b8532f80594b32021-11-25T18:43:11ZMulti-Wavelength Optical Patterning for Multiscale Materials Design10.3390/photonics81104812304-6732https://doaj.org/article/fec36560db2f4f3ea68b8532f80594b32021-10-01T00:00:00Zhttps://www.mdpi.com/2304-6732/8/11/481https://doaj.org/toc/2304-6732Laser interferometry is a consolidated technique for materials structuring, enabling single step and large area patterning. Here we report the investigation of the morphological modification encoded on a thin film of a photosensitive material by the light interference pattern obtained from a laser operating in multiline mode. Four lines with equal intensity are retained, with the same p linear polarization. An azopolymer is exploited as medium for the holographic recording. Optical microscopy and profilometer measurements analyze the modification induced in the bulk and on the surface of the irradiated area. We show that the intensity profile of the interference patterns of two laser beams is the one obtained assuming each line of the laser as an independent oscillator of given intensity and wavelength, and how these light structures are faithfully replicated in the material bulk and on the topography of the free surface. Patterns at different length scales are achievable in a single step, that can be traced back to both interference fringes and wave envelopes. The proposed multi-wavelength holographic patterning provides a simple tool to generate complex light structures, able to perform multiscale modifications of photoresponsive materialsBiagio AudiaPasquale PagliusiAlfredo MazzullaGabriella CipparroneMDPI AGarticleholographic patterningphotoresponsive materialssurface relief grating (SRG)azobenzeneApplied optics. PhotonicsTA1501-1820ENPhotonics, Vol 8, Iss 481, p 481 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	holographic patterning photoresponsive materials surface relief grating (SRG) azobenzene Applied optics. Photonics TA1501-1820
spellingShingle	holographic patterning photoresponsive materials surface relief grating (SRG) azobenzene Applied optics. Photonics TA1501-1820 Biagio Audia Pasquale Pagliusi Alfredo Mazzulla Gabriella Cipparrone Multi-Wavelength Optical Patterning for Multiscale Materials Design
description	Laser interferometry is a consolidated technique for materials structuring, enabling single step and large area patterning. Here we report the investigation of the morphological modification encoded on a thin film of a photosensitive material by the light interference pattern obtained from a laser operating in multiline mode. Four lines with equal intensity are retained, with the same p linear polarization. An azopolymer is exploited as medium for the holographic recording. Optical microscopy and profilometer measurements analyze the modification induced in the bulk and on the surface of the irradiated area. We show that the intensity profile of the interference patterns of two laser beams is the one obtained assuming each line of the laser as an independent oscillator of given intensity and wavelength, and how these light structures are faithfully replicated in the material bulk and on the topography of the free surface. Patterns at different length scales are achievable in a single step, that can be traced back to both interference fringes and wave envelopes. The proposed multi-wavelength holographic patterning provides a simple tool to generate complex light structures, able to perform multiscale modifications of photoresponsive materials
format	article
author	Biagio Audia Pasquale Pagliusi Alfredo Mazzulla Gabriella Cipparrone
author_facet	Biagio Audia Pasquale Pagliusi Alfredo Mazzulla Gabriella Cipparrone
author_sort	Biagio Audia
title	Multi-Wavelength Optical Patterning for Multiscale Materials Design
title_short	Multi-Wavelength Optical Patterning for Multiscale Materials Design
title_full	Multi-Wavelength Optical Patterning for Multiscale Materials Design
title_fullStr	Multi-Wavelength Optical Patterning for Multiscale Materials Design
title_full_unstemmed	Multi-Wavelength Optical Patterning for Multiscale Materials Design
title_sort	multi-wavelength optical patterning for multiscale materials design
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/fec36560db2f4f3ea68b8532f80594b3
work_keys_str_mv	AT biagioaudia multiwavelengthopticalpatterningformultiscalematerialsdesign AT pasqualepagliusi multiwavelengthopticalpatterningformultiscalematerialsdesign AT alfredomazzulla multiwavelengthopticalpatterningformultiscalematerialsdesign AT gabriellacipparrone multiwavelengthopticalpatterningformultiscalematerialsdesign
_version_	1718410811921137664

Multi-Wavelength Optical Patterning for Multiscale Materials Design

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