Deposition of nickel films by TVA
Plasma diagnostic techniques are essential for understanding of process parameters. In plasma-assisted deposition, ion energy and deposition rate are key parameters for technological control. In this paper, a systematic study of the correlation of electrical parameters of plasma with ion ener...
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| Autores principales: | , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2008
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/feccd85af4334590abc332d0e0f2df32 |
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| Sumario: | Plasma diagnostic techniques are essential for understanding of process parameters. In
plasma-assisted deposition, ion energy and deposition rate are key parameters for
technological control.
In this paper, a systematic study of the correlation of electrical parameters of plasma
with ion energy distributions and deposition rate is presented.
The deposition method used in this study is Thermionic Vacuum Arc (TVA) ignited in
nickel vapors.
The TVA deposition method briefly consists in obtaining of plasma in vapors of the
material to be evaporated. The vapors are obtained by heating the material with
thermoelectrons generated by an externally heated filament. An in-house, computer-controlled
RFA analyzer was used for determination of ion energy distributions at a point situated about
25 cm from the anode. The retarding field analyzer (RFA) is an electrical probe capable of
providing ion energy distributions in plasmas. AFM analysis has shown that nickel films obtained by TVA are very smooth.
It was found that the ion energy increases with the power introduced into the system and
it decreases with decreasing filament current. The adhesion for the films deposited by TVA
was found to be very good. A clear picture of the optimal TVA plasma conditions for the
highest adhesion and deposition rate was obtained. |
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