Deposition of nickel films by TVA
Plasma diagnostic techniques are essential for understanding of process parameters. In plasma-assisted deposition, ion energy and deposition rate are key parameters for technological control. In this paper, a systematic study of the correlation of electrical parameters of plasma with ion ener...
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| Autores principales: | , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2008
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/feccd85af4334590abc332d0e0f2df32 |
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