In-Depth Study of 3D Color-Resist Coating Process for Optically Uniform Image Sensors

In-Depth Study of 3D Color-Resist Coating Process for Optically Uniform Image Sensors

The color filter required for manufacturing a CMOS image sensor was redeveloped to optimize its optical uniformity. An in-depth study of the three-dimensional (3D) coating process and how it gives rise to various radial-shaped striation patterns was conducted. These radial-shaped striation patterns...

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Bibliographic Details
Main Authors: Sungjun Kim, Jaesang Yoo, Hakyu Choi, Jaekwan Seo, Sunghun Lee, Sang Min Won, Jin-Hong Park, Keun Heo
Format: article
Language:EN
Published: IEEE 2021
Subjects:
CMOS image sensor
color filter process
spin coating
radial striation pattern
fluidic dynamics
process optimization
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Online Access:https://doaj.org/article/fedab6d35b1c44bd934194ab77bd46fc
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https://doaj.org/article/fedab6d35b1c44bd934194ab77bd46fc

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