Preparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays

Dense SiC ceramics were fabricated by high-temperature physical vapor transport (HTPVT) growth process using SiC nanoarrays as the crystal seeds, which was obtained by vacuum heat treatment of amorphous SiC films prepared by plasma-enhanced chemical vapor deposition (PECVD) with a porous anodic alum...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Yu-Chen Deng, Nan-Long Zhang, Qiang Zhi, Bo Wang, Jian-Feng Yang
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
T
Acceso en línea:https://doaj.org/article/ff6a8a77ab0643f3b3435012522bd7a2
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
id oai:doaj.org-article:ff6a8a77ab0643f3b3435012522bd7a2
record_format dspace
spelling oai:doaj.org-article:ff6a8a77ab0643f3b3435012522bd7a22021-11-11T17:53:13ZPreparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays10.3390/ma142163171996-1944https://doaj.org/article/ff6a8a77ab0643f3b3435012522bd7a22021-10-01T00:00:00Zhttps://www.mdpi.com/1996-1944/14/21/6317https://doaj.org/toc/1996-1944Dense SiC ceramics were fabricated by high-temperature physical vapor transport (HTPVT) growth process using SiC nanoarrays as the crystal seeds, which was obtained by vacuum heat treatment of amorphous SiC films prepared by plasma-enhanced chemical vapor deposition (PECVD) with a porous anodic aluminum oxide (AAO) template. In the HTPVT process, two-step holding was adopted, and the temperature at the first step was controlled at 2100 and 2150 °C to avoid SiC nanoarrays evaporation, and the grain size of SiC crystal increased with the increase in temperature and decrease in the pressure of Ar. The temperature of the second step was 2300 °C, and rapid SiC grain growth and gradual densification were achieved. The prepared SiC ceramics exhibited a relative density of more than 99%, an average grain size of about 100 μm, a preferred orientation along the (0 0 0 6) plane, a Vickers hardness of about 29 GPa, a flexural strength of about 360 MPa, and thermal conductivity at room temperature of more than 200 W·m<sup>−1</sup>·K<sup>−1</sup>.Yu-Chen DengNan-Long ZhangQiang ZhiBo WangJian-Feng YangMDPI AGarticlesilicon carbidenanoarraysHTPVTPECVDTechnologyTElectrical engineering. Electronics. Nuclear engineeringTK1-9971Engineering (General). Civil engineering (General)TA1-2040MicroscopyQH201-278.5Descriptive and experimental mechanicsQC120-168.85ENMaterials, Vol 14, Iss 6317, p 6317 (2021)
institution DOAJ
collection DOAJ
language EN
topic silicon carbide
nanoarrays
HTPVT
PECVD
Technology
T
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Engineering (General). Civil engineering (General)
TA1-2040
Microscopy
QH201-278.5
Descriptive and experimental mechanics
QC120-168.85
spellingShingle silicon carbide
nanoarrays
HTPVT
PECVD
Technology
T
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Engineering (General). Civil engineering (General)
TA1-2040
Microscopy
QH201-278.5
Descriptive and experimental mechanics
QC120-168.85
Yu-Chen Deng
Nan-Long Zhang
Qiang Zhi
Bo Wang
Jian-Feng Yang
Preparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays
description Dense SiC ceramics were fabricated by high-temperature physical vapor transport (HTPVT) growth process using SiC nanoarrays as the crystal seeds, which was obtained by vacuum heat treatment of amorphous SiC films prepared by plasma-enhanced chemical vapor deposition (PECVD) with a porous anodic aluminum oxide (AAO) template. In the HTPVT process, two-step holding was adopted, and the temperature at the first step was controlled at 2100 and 2150 °C to avoid SiC nanoarrays evaporation, and the grain size of SiC crystal increased with the increase in temperature and decrease in the pressure of Ar. The temperature of the second step was 2300 °C, and rapid SiC grain growth and gradual densification were achieved. The prepared SiC ceramics exhibited a relative density of more than 99%, an average grain size of about 100 μm, a preferred orientation along the (0 0 0 6) plane, a Vickers hardness of about 29 GPa, a flexural strength of about 360 MPa, and thermal conductivity at room temperature of more than 200 W·m<sup>−1</sup>·K<sup>−1</sup>.
format article
author Yu-Chen Deng
Nan-Long Zhang
Qiang Zhi
Bo Wang
Jian-Feng Yang
author_facet Yu-Chen Deng
Nan-Long Zhang
Qiang Zhi
Bo Wang
Jian-Feng Yang
author_sort Yu-Chen Deng
title Preparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays
title_short Preparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays
title_full Preparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays
title_fullStr Preparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays
title_full_unstemmed Preparation and Characterization of Pure SiC Ceramics by HTPVT Induced by Seeding with SiC Nanoarrays
title_sort preparation and characterization of pure sic ceramics by htpvt induced by seeding with sic nanoarrays
publisher MDPI AG
publishDate 2021
url https://doaj.org/article/ff6a8a77ab0643f3b3435012522bd7a2
work_keys_str_mv AT yuchendeng preparationandcharacterizationofpuresicceramicsbyhtpvtinducedbyseedingwithsicnanoarrays
AT nanlongzhang preparationandcharacterizationofpuresicceramicsbyhtpvtinducedbyseedingwithsicnanoarrays
AT qiangzhi preparationandcharacterizationofpuresicceramicsbyhtpvtinducedbyseedingwithsicnanoarrays
AT bowang preparationandcharacterizationofpuresicceramicsbyhtpvtinducedbyseedingwithsicnanoarrays
AT jianfengyang preparationandcharacterizationofpuresicceramicsbyhtpvtinducedbyseedingwithsicnanoarrays
_version_ 1718432039406927872