GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE

GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE

The compounds N3P3[NH(CH2)3Si(OEt)3]6 (1), N3P3[NH(CH2)3Si(OEt)3]3[NCH3(CH2)3CN]3 (2) and N3P3[NH(CH2)3Si(OEt)3]3 [HOC6H4(CH2)CN]3 (3) undergo slow gelation at the interface oil/air at low temperatures to give perfect gels G1, G2 and G3 respective ly. TEM analysis reveals nanoparticles of silica wit...

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Autores principales: DÍAZ,CARLOS, VALENZUELA,MARÍA LUISA, YUTRONIC,NICOLAS, AGUIRRE,PEDRO
Lenguaje:English
Publicado: Sociedad Chilena de Química 2010
Materias:
Sol-gel
cyclotriphosphazenes
nanostructure materials
silica nanoparticles
Phosphazenes
Acceso en línea:http://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072010000300031
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spelling oai:scielo:S0717-970720100003000312011-01-25GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACEDÍAZ,CARLOSVALENZUELA,MARÍA LUISAYUTRONIC,NICOLASAGUIRRE,PEDRO Sol-gel cyclotriphosphazenes nanostructure materials silica nanoparticles Phosphazenes The compounds N3P3[NH(CH2)3Si(OEt)3]6 (1), N3P3[NH(CH2)3Si(OEt)3]3[NCH3(CH2)3CN]3 (2) and N3P3[NH(CH2)3Si(OEt)3]3 [HOC6H4(CH2)CN]3 (3) undergo slow gelation at the interface oil/air at low temperatures to give perfect gels G1, G2 and G3 respective ly. TEM analysis reveals nanoparticles of silica with mean size of about 10 nm. Pyrolysis under air at 800 °C of these gels affords a mixture of mainly Si5(PO4)6O, SiP2O7 and SiO2. Gelation and pyrolysis products were characterized by IR, solid-state NMR, TEM, SEM-EDAX microscopy and X-ray diffraction. The sol-gel process in the interface liquid /air is discussed in comparison with the usual sol-gel solution process.info:eu-repo/semantics/openAccessSociedad Chilena de QuímicaJournal of the Chilean Chemical Society v.55 n.3 20102010-01-01text/htmlhttp://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072010000300031en10.4067/S0717-97072010000300031
institution Scielo Chile
collection Scielo Chile
language English
topic Sol-gel
cyclotriphosphazenes
nanostructure materials
silica nanoparticles
Phosphazenes
spellingShingle Sol-gel
cyclotriphosphazenes
nanostructure materials
silica nanoparticles
Phosphazenes
DÍAZ,CARLOS
VALENZUELA,MARÍA LUISA
YUTRONIC,NICOLAS
AGUIRRE,PEDRO
GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE
description The compounds N3P3[NH(CH2)3Si(OEt)3]6 (1), N3P3[NH(CH2)3Si(OEt)3]3[NCH3(CH2)3CN]3 (2) and N3P3[NH(CH2)3Si(OEt)3]3 [HOC6H4(CH2)CN]3 (3) undergo slow gelation at the interface oil/air at low temperatures to give perfect gels G1, G2 and G3 respective ly. TEM analysis reveals nanoparticles of silica with mean size of about 10 nm. Pyrolysis under air at 800 °C of these gels affords a mixture of mainly Si5(PO4)6O, SiP2O7 and SiO2. Gelation and pyrolysis products were characterized by IR, solid-state NMR, TEM, SEM-EDAX microscopy and X-ray diffraction. The sol-gel process in the interface liquid /air is discussed in comparison with the usual sol-gel solution process.
author DÍAZ,CARLOS
VALENZUELA,MARÍA LUISA
YUTRONIC,NICOLAS
AGUIRRE,PEDRO
author_facet DÍAZ,CARLOS
VALENZUELA,MARÍA LUISA
YUTRONIC,NICOLAS
AGUIRRE,PEDRO
author_sort DÍAZ,CARLOS
title GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE
title_short GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE
title_full GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE
title_fullStr GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE
title_full_unstemmed GELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACE
title_sort gelation of n3p3[nh(ch2)3si(oet)3]6-n [x]n x = nh(ch2)3si(oet)3, nch3(ch2)3cn and oc6h4(ch2)cn, n = 0 or 3 at the liquid/air/interface
publisher Sociedad Chilena de Química
publishDate 2010
url http://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072010000300031
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AT valenzuelamarialuisa gelationofn3p3nhch23sioet36nxnxnhch23sioet3nch3ch23cnandoc6h4ch2cnn0or3attheliquidairinterface
AT yutronicnicolas gelationofn3p3nhch23sioet36nxnxnhch23sioet3nch3ch23cnandoc6h4ch2cnn0or3attheliquidairinterface
AT aguirrepedro gelationofn3p3nhch23sioet36nxnxnhch23sioet3nch3ch23cnandoc6h4ch2cnn0or3attheliquidairinterface
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