USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS

This work presents the results of a thin electroplated layer of nickel on the surface of the uranium to achieve deposits 15 to 25 μm thick. Ultrasound tests and electron microscopy showed good adhesion and homogeneity of the Ni deposit, which has high hardness and relatively small grain siz...

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Autores principales:	LISBOA,J, CIFUENTES,G, MARIN,J, MIERES,E
Lenguaje:	English
Publicado:	Sociedad Chilena de Química 2013
Materias:	Electroplating uranium nickel
Acceso en línea:	http://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072013000400044
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id	oai:scielo:S0717-97072013000400044
record_format	dspace
spelling	oai:scielo:S0717-970720130004000442014-09-02USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETSLISBOA,JCIFUENTES,GMARIN,JMIERES,E Electroplating uranium nickel This work presents the results of a thin electroplated layer of nickel on the surface of the uranium to achieve deposits 15 to 25 μm thick. Ultrasound tests and electron microscopy showed good adhesion and homogeneity of the Ni deposit, which has high hardness and relatively small grain size, with an orientation in the direction of current flow.info:eu-repo/semantics/openAccessSociedad Chilena de QuímicaJournal of the Chilean Chemical Society v.58 n.4 20132013-12-01text/htmlhttp://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072013000400044en10.4067/S0717-97072013000400044
institution	Scielo Chile
collection	Scielo Chile
language	English
topic	Electroplating uranium nickel
spellingShingle	Electroplating uranium nickel LISBOA,J CIFUENTES,G MARIN,J MIERES,E USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS
description	This work presents the results of a thin electroplated layer of nickel on the surface of the uranium to achieve deposits 15 to 25 μm thick. Ultrasound tests and electron microscopy showed good adhesion and homogeneity of the Ni deposit, which has high hardness and relatively small grain size, with an orientation in the direction of current flow.
author	LISBOA,J CIFUENTES,G MARIN,J MIERES,E
author_facet	LISBOA,J CIFUENTES,G MARIN,J MIERES,E
author_sort	LISBOA,J
title	USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS
title_short	USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS
title_full	USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS
title_fullStr	USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS
title_full_unstemmed	USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS
title_sort	use of electrodeposition of nickel in the manufacture of leu annular targets
publisher	Sociedad Chilena de Química
publishDate	2013
url	http://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072013000400044
work_keys_str_mv	AT lisboaj useofelectrodepositionofnickelinthemanufactureofleuannulartargets AT cifuentesg useofelectrodepositionofnickelinthemanufactureofleuannulartargets AT marinj useofelectrodepositionofnickelinthemanufactureofleuannulartargets AT mierese useofelectrodepositionofnickelinthemanufactureofleuannulartargets
_version_	1718445503989940224

USE OF ELECTRODEPOSITION OF NICKEL IN THE MANUFACTURE OF LEU ANNULAR TARGETS

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