Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

por Alireza Kazemi, Xiang He, Seyedhamidreza Alaie, Javad Ghasemi, Noel Mayur Dawson, Francesca Cavallo, Terefe G. Habteyes, Steven R. J. Brueck, Sanjay Krishna
Publicado 2021