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por Gustavo Fenalti, Nicolas Villanueva, Mark Griffith, Barbra Pagarigan, Sirish Kaushik Lakkaraju, Richard Y.-C. Huang, Nadia Ladygina, Alok Sharma, David Mikolon, Mahan Abbasian, Jeffrey Johnson, Haralambos Hadjivassiliou, Dan Zhu, Philip P. Chamberlain, Ho Cho, Kandasamy Hariharan
Publicado 2021

Ge FinFET CMOS Inverters With Improved Channel Surface Roughness by Using <italic>In-Situ</italic> ALD Digital O₃ Treatment

por M.-S. Yeh, G.-L. Luo, F.-J. Hou, P.-J. Sung, C. J. Wang, C.-J. Su, C.-T. WU, Y.-C. Huang, T.-C. Hong, B.-Y. Chen, K.-M. Chen, Y.-C. WU, M. Izawa, M. Miura, M. Morimoto, H. Ishimura, Y.-J. Lee, W.-F. Wu, W.-K. Yeh
Publicado 2018