Shie, K., Hsu, P., Li, Y., Tu, K. N., & Chen, C. (2021). Effect of Bonding Strength on Electromigration Failure in Cu–Cu Bumps. MDPI AG.
Cita Chicago Style (17a ed.)Shie, Kai-Cheng, Po-Ning Hsu, Yu-Jin Li, K. N. Tu, y Chih Chen. Effect of Bonding Strength on Electromigration Failure in Cu–Cu Bumps. MDPI AG, 2021.
Cita MLA (8a ed.)Shie, Kai-Cheng, et al. Effect of Bonding Strength on Electromigration Failure in Cu–Cu Bumps. MDPI AG, 2021.
Precaución: Estas citas no son 100% exactas.