Superjunction Power Transistors With Interface Charges: A Case Study for GaN

Recent progress in p-GaN trench-filling epitaxy has shown promise for the demonstration of GaN superjunction (SJ) devices. However, the presence of n-type interface charges at the regrowth interfaces has been widely observed. These interface charges pose great challenges to the design and performanc...

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Autores principales: Yunwei Ma, Ming Xiao, Ruizhe Zhang, Han Wang, Yuhao Zhang
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Publicado: IEEE 2020
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spelling oai:doaj.org-article:00582700c8e245ffabfc1b5cce9d4da12021-11-19T00:01:17ZSuperjunction Power Transistors With Interface Charges: A Case Study for GaN2168-673410.1109/JEDS.2019.2959713https://doaj.org/article/00582700c8e245ffabfc1b5cce9d4da12020-01-01T00:00:00Zhttps://ieeexplore.ieee.org/document/8932530/https://doaj.org/toc/2168-6734Recent progress in p-GaN trench-filling epitaxy has shown promise for the demonstration of GaN superjunction (SJ) devices. However, the presence of n-type interface charges at the regrowth interfaces has been widely observed. These interface charges pose great challenges to the design and performance evaluation of SJ devices. This work presents an analytical model for SJ devices with interface charges for the first time. In our model, two approaches are proposed to compensate interface charges, by the modulation of the SJ doping or the SJ geometry. Based on our model, an analytical study is conducted for GaN SJ transistors, revealing the design windows and optimal values of doping concentration and pillar width as a function of interface charge density. Finally, TCAD simulation is performed for vertical GaN SJ transistors, which validated our analytical model. Our results show that, with optimal designs, interface charges would only induce small degradation in the performance of GaN SJ devices. However, with the increased interface charge density, the design windows for pillar width and doping concentration become increasingly narrow and the upper limit in the pillar width window reduces quickly. When the interface charge density exceeds <inline-formula> <tex-math notation="LaTeX">$\sim 3\times 10^{12}$ </tex-math></inline-formula> cm<sup>&#x2212;2</sup>, the design window of pillar width completely falls into the sub-micron range, indicating significant difficulties in fabrication. Vertical GaN SJ transistors with interface charges retain great advantages over conventional GaN power transistors, but have narrower design windows and require different design rules compared to ideal GaN SJ devices.Yunwei MaMing XiaoRuizhe ZhangHan WangYuhao ZhangIEEEarticlePower electronicspower semiconductor devicessuperjunctioninterface chargesinterface impuritiesgallium nitrideElectrical engineering. Electronics. Nuclear engineeringTK1-9971ENIEEE Journal of the Electron Devices Society, Vol 8, Pp 42-48 (2020)
institution DOAJ
collection DOAJ
language EN
topic Power electronics
power semiconductor devices
superjunction
interface charges
interface impurities
gallium nitride
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
spellingShingle Power electronics
power semiconductor devices
superjunction
interface charges
interface impurities
gallium nitride
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Yunwei Ma
Ming Xiao
Ruizhe Zhang
Han Wang
Yuhao Zhang
Superjunction Power Transistors With Interface Charges: A Case Study for GaN
description Recent progress in p-GaN trench-filling epitaxy has shown promise for the demonstration of GaN superjunction (SJ) devices. However, the presence of n-type interface charges at the regrowth interfaces has been widely observed. These interface charges pose great challenges to the design and performance evaluation of SJ devices. This work presents an analytical model for SJ devices with interface charges for the first time. In our model, two approaches are proposed to compensate interface charges, by the modulation of the SJ doping or the SJ geometry. Based on our model, an analytical study is conducted for GaN SJ transistors, revealing the design windows and optimal values of doping concentration and pillar width as a function of interface charge density. Finally, TCAD simulation is performed for vertical GaN SJ transistors, which validated our analytical model. Our results show that, with optimal designs, interface charges would only induce small degradation in the performance of GaN SJ devices. However, with the increased interface charge density, the design windows for pillar width and doping concentration become increasingly narrow and the upper limit in the pillar width window reduces quickly. When the interface charge density exceeds <inline-formula> <tex-math notation="LaTeX">$\sim 3\times 10^{12}$ </tex-math></inline-formula> cm<sup>&#x2212;2</sup>, the design window of pillar width completely falls into the sub-micron range, indicating significant difficulties in fabrication. Vertical GaN SJ transistors with interface charges retain great advantages over conventional GaN power transistors, but have narrower design windows and require different design rules compared to ideal GaN SJ devices.
format article
author Yunwei Ma
Ming Xiao
Ruizhe Zhang
Han Wang
Yuhao Zhang
author_facet Yunwei Ma
Ming Xiao
Ruizhe Zhang
Han Wang
Yuhao Zhang
author_sort Yunwei Ma
title Superjunction Power Transistors With Interface Charges: A Case Study for GaN
title_short Superjunction Power Transistors With Interface Charges: A Case Study for GaN
title_full Superjunction Power Transistors With Interface Charges: A Case Study for GaN
title_fullStr Superjunction Power Transistors With Interface Charges: A Case Study for GaN
title_full_unstemmed Superjunction Power Transistors With Interface Charges: A Case Study for GaN
title_sort superjunction power transistors with interface charges: a case study for gan
publisher IEEE
publishDate 2020
url https://doaj.org/article/00582700c8e245ffabfc1b5cce9d4da1
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AT mingxiao superjunctionpowertransistorswithinterfacechargesacasestudyforgan
AT ruizhezhang superjunctionpowertransistorswithinterfacechargesacasestudyforgan
AT hanwang superjunctionpowertransistorswithinterfacechargesacasestudyforgan
AT yuhaozhang superjunctionpowertransistorswithinterfacechargesacasestudyforgan
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