Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions

The continued scaling of silicon based electronic devices requires the development of increasingly innovative approaches for high-precision material removal. Here, the authors demonstrate subnanometre depth removal of silicon using scanning probe, shear-induced mechanochemical reactions.

Guardado en:

Detalles Bibliográficos
Autores principales:	Lei Chen, Jialin Wen, Peng Zhang, Bingjun Yu, Cheng Chen, Tianbao Ma, Xinchun Lu, Seong H. Kim, Linmao Qian
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2018
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/1071abe741d246fea39f12ba76a2af02
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:1071abe741d246fea39f12ba76a2af02
record_format	dspace
spelling	oai:doaj.org-article:1071abe741d246fea39f12ba76a2af022021-12-02T15:33:46ZNanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions10.1038/s41467-018-03930-52041-1723https://doaj.org/article/1071abe741d246fea39f12ba76a2af022018-04-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-03930-5https://doaj.org/toc/2041-1723The continued scaling of silicon based electronic devices requires the development of increasingly innovative approaches for high-precision material removal. Here, the authors demonstrate subnanometre depth removal of silicon using scanning probe, shear-induced mechanochemical reactions.Lei ChenJialin WenPeng ZhangBingjun YuCheng ChenTianbao MaXinchun LuSeong H. KimLinmao QianNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-7 (2018)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Lei Chen Jialin Wen Peng Zhang Bingjun Yu Cheng Chen Tianbao Ma Xinchun Lu Seong H. Kim Linmao Qian Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
description	The continued scaling of silicon based electronic devices requires the development of increasingly innovative approaches for high-precision material removal. Here, the authors demonstrate subnanometre depth removal of silicon using scanning probe, shear-induced mechanochemical reactions.
format	article
author	Lei Chen Jialin Wen Peng Zhang Bingjun Yu Cheng Chen Tianbao Ma Xinchun Lu Seong H. Kim Linmao Qian
author_facet	Lei Chen Jialin Wen Peng Zhang Bingjun Yu Cheng Chen Tianbao Ma Xinchun Lu Seong H. Kim Linmao Qian
author_sort	Lei Chen
title	Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
title_short	Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
title_full	Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
title_fullStr	Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
title_full_unstemmed	Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
title_sort	nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
publisher	Nature Portfolio
publishDate	2018
url	https://doaj.org/article/1071abe741d246fea39f12ba76a2af02
work_keys_str_mv	AT leichen nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT jialinwen nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT pengzhang nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT bingjunyu nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT chengchen nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT tianbaoma nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT xinchunlu nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT seonghkim nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions AT linmaoqian nanomanufacturingofsiliconsurfacewithasingleatomiclayerprecisionviamechanochemicalreactions
_version_	1718387004787392512

Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions

Ejemplares similares