AlGaN-Based 1.55 µm Phototransistor as a Crucial Building Block for Optical Computers
An optically activated, enhancement mode heterostructure field effect transistor is proposed and analytically studied. A particular feature of this device is its gate region, which is made of a photovoltaic GaN/AlN-based superlattice detector for a wavelength of 1.55 µm. Since the inter-subband tran...
Guardado en:
Autores principales: | Daniel Hofstetter, Cynthia Aku-Leh, Hans Beck, David P. Bour |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
MDPI AG
2021
|
Materias: | |
Acceso en línea: | https://doaj.org/article/174ff9195f664f5bb2edfabcce176fe6 |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares
-
Substrate Effects on the Electrical Properties in GaN-Based High Electron Mobility Transistors
por: Sung-Jae Chang, et al.
Publicado: (2021) -
Normally-off p-GaN Gated AlGaN/GaN HEMTs Using Plasma Oxidation Technique in Access Region
por: Xinke Liu, et al.
Publicado: (2020) -
Study of Normally-Off AlGaN/GaN HEMT with Microfield Plate for Improvement of Breakdown Voltage
por: Xiaoyu Xia, et al.
Publicado: (2021) -
Effect of Hot Electron Stress on AlGaN/GaN HEMTs of Hydrogen Poisoning
por: J. He, et al.
Publicado: (2019) -
Theoretical and Experimental Substractions of Device Temperature Determination Utilizing I-V Characterization Applied on AlGaN/GaN HEMT
por: Martin Florovič, et al.
Publicado: (2021)