Imperfect two-dimensional topological insulator field-effect transistors

A challenge of using 2D materials for nanoelectronic devices is the need for defect-free lattice supporting efficient carrier transport. Here, the authors show theoretically that 2D topological insulators enable high-performance, low-power field-effect transistors without requiring defect-free mater...

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Autores principales: William G. Vandenberghe, Massimo V. Fischetti
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/17c9256e5441409fac675d98bf2b152b
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