Thermal Stability of Hole-Selective Tungsten Oxide: In Situ Transmission Electron Microscopy Study
Abstract In this study, the thermal stability of a contact structure featuring hole-selective tungsten oxide (WOx) and aluminum deposited onto p-type crystalline silicon (c-Si/WOx/Al) was investigated using a combination of transmission line measurements (TLM) and in situ transmission electron micro...
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| Auteurs principaux: | , , , , , , |
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| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2018
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| Accès en ligne: | https://doaj.org/article/1b6078e0de8c48fea93f47dc59241bbc |
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