Thermal Stability of Hole-Selective Tungsten Oxide: In Situ Transmission Electron Microscopy Study

Thermal Stability of Hole-Selective Tungsten Oxide: In Situ Transmission Electron Microscopy Study

Abstract In this study, the thermal stability of a contact structure featuring hole-selective tungsten oxide (WOx) and aluminum deposited onto p-type crystalline silicon (c-Si/WOx/Al) was investigated using a combination of transmission line measurements (TLM) and in situ transmission electron micro...

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Autores principales: Haider Ali, Supriya Koul, Geoffrey Gregory, James Bullock, Ali Javey, Akihiro Kushima, Kristopher O. Davis
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2018
Materias:
Medicine
R
Science
Q
Acceso en línea:https://doaj.org/article/1b6078e0de8c48fea93f47dc59241bbc
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