Effect of annealing temperature on the interface state density of n-ZnO nanorod/p-Si heterojunction diodes

The effect of post-growth annealing treatment of zinc oxide (ZnO) nanorods on the electrical properties of their heterojunction diodes (HJDs) is investigated. ZnO nanorods are synthesized by the low-temperature aqueous solution growth technique and annealed at temperatures of 400 and 600°C. The as-g...

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Autores principales: Faraz Sadia Muniza, Jafri Syed Riaz un Nabi, Khan Hashim Raza, Shah Wakeel, Alvi Naveed ul Hassan, Wahab Qamar ul, Nur Omer
Formato: article
Lenguaje:EN
Publicado: De Gruyter 2021
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Acceso en línea:https://doaj.org/article/1fd720e014cf41f6a33fc7c310064665
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