Growth and characterization of W thin films with controlled Ne and Ar contents deposited by bipolar HiPIMS
This work is focused on controlling and optimizing the inclusion of neon (Ne) and argon (Ar) impurities in tungsten (W) reference coatings. A tungsten target has been sputtered in monopolar and bipolar High Power Impulse Magnetron Sputtering (HiPIMS) operation modes, in Ar-Ne gas mixture. It has bee...
Guardado en:
| Autores principales: | , , , , , , |
|---|---|
| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Elsevier
2021
|
| Materias: | |
| Acceso en línea: | https://doaj.org/article/2342186eac744a2d924e9fcf39ca1459 |
| Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|