Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases
High-density phases of TiO<sub>2</sub>, such as rutile and high-pressure TiO<sub>2</sub>-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO<sub>2</sub>-II with anatase and rutile have been...
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| Autores principales: | , , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
MDPI AG
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/254cd2b1dc7e4b5188ee6668084d8a4b |
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| Sumario: | High-density phases of TiO<sub>2</sub>, such as rutile and high-pressure TiO<sub>2</sub>-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO<sub>2</sub>-II with anatase and rutile have been considered promising materials for catalytic applications. In this work, the atomic layer deposition of TiO<sub>2</sub> on α-Al<sub>2</sub>O<sub>3</sub> (0 0 0 1) (c-sapphire) was used to grow thin films containing different combinations of TiO<sub>2</sub>-II, anatase, and rutile, and to investigate the properties of the films. The results obtained demonstrate that in a temperature range of 300–400 °C, where transition from anatase to TiO<sub>2</sub>-II and rutile growth occurs in the films deposited on c-sapphire, the phase composition and other properties of a film depend significantly on the film thickness and ALD process time parameters. The changes in the phase composition, related to formation of the TiO<sub>2</sub>-II phase, caused an increase in the density and refractive index, minor narrowing of the optical bandgap, and an increase in the hardness of the films deposited on c-sapphire at T<sub>G</sub> ≥ 400 °C. These properties, together with high catalytic efficiency of mixed TiO<sub>2</sub>-II and anatase phases, as reported earlier, make the films promising for application in various functional coatings. |
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