Influence of α-Al2O3 Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO2 Phases

High-density phases of TiO2, such as rutile and high-pressure TiO2-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO2-II with anatase and rutile have been...

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Autores principales:	Kristel Möls, Lauri Aarik, Hugo Mändar, Aarne Kasikov, Taivo Jõgiaas, Aivar Tarre, Jaan Aarik
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	titanium dioxide thin films atomic layer deposition anatase rutile TiO<sub>2</sub>-II Engineering (General). Civil engineering (General) TA1-2040
Acceso en línea:	https://doaj.org/article/254cd2b1dc7e4b5188ee6668084d8a4b
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spelling	oai:doaj.org-article:254cd2b1dc7e4b5188ee6668084d8a4b2021-11-25T17:15:31ZInfluence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases10.3390/coatings111112802079-6412https://doaj.org/article/254cd2b1dc7e4b5188ee6668084d8a4b2021-10-01T00:00:00Zhttps://www.mdpi.com/2079-6412/11/11/1280https://doaj.org/toc/2079-6412High-density phases of TiO<sub>2</sub>, such as rutile and high-pressure TiO<sub>2</sub>-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO<sub>2</sub>-II with anatase and rutile have been considered promising materials for catalytic applications. In this work, the atomic layer deposition of TiO<sub>2</sub> on α-Al<sub>2</sub>O<sub>3</sub> (0 0 0 1) (c-sapphire) was used to grow thin films containing different combinations of TiO<sub>2</sub>-II, anatase, and rutile, and to investigate the properties of the films. The results obtained demonstrate that in a temperature range of 300–400 °C, where transition from anatase to TiO<sub>2</sub>-II and rutile growth occurs in the films deposited on c-sapphire, the phase composition and other properties of a film depend significantly on the film thickness and ALD process time parameters. The changes in the phase composition, related to formation of the TiO<sub>2</sub>-II phase, caused an increase in the density and refractive index, minor narrowing of the optical bandgap, and an increase in the hardness of the films deposited on c-sapphire at T<sub>G</sub> ≥ 400 °C. These properties, together with high catalytic efficiency of mixed TiO<sub>2</sub>-II and anatase phases, as reported earlier, make the films promising for application in various functional coatings.Kristel MölsLauri AarikHugo MändarAarne KasikovTaivo JõgiaasAivar TarreJaan AarikMDPI AGarticletitanium dioxidethin filmsatomic layer depositionanataserutileTiO<sub>2</sub>-IIEngineering (General). Civil engineering (General)TA1-2040ENCoatings, Vol 11, Iss 1280, p 1280 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	titanium dioxide thin films atomic layer deposition anatase rutile TiO<sub>2</sub>-II Engineering (General). Civil engineering (General) TA1-2040
spellingShingle	titanium dioxide thin films atomic layer deposition anatase rutile TiO<sub>2</sub>-II Engineering (General). Civil engineering (General) TA1-2040 Kristel Möls Lauri Aarik Hugo Mändar Aarne Kasikov Taivo Jõgiaas Aivar Tarre Jaan Aarik Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases
description	High-density phases of TiO<sub>2</sub>, such as rutile and high-pressure TiO<sub>2</sub>-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO<sub>2</sub>-II with anatase and rutile have been considered promising materials for catalytic applications. In this work, the atomic layer deposition of TiO<sub>2</sub> on α-Al<sub>2</sub>O<sub>3</sub> (0 0 0 1) (c-sapphire) was used to grow thin films containing different combinations of TiO<sub>2</sub>-II, anatase, and rutile, and to investigate the properties of the films. The results obtained demonstrate that in a temperature range of 300–400 °C, where transition from anatase to TiO<sub>2</sub>-II and rutile growth occurs in the films deposited on c-sapphire, the phase composition and other properties of a film depend significantly on the film thickness and ALD process time parameters. The changes in the phase composition, related to formation of the TiO<sub>2</sub>-II phase, caused an increase in the density and refractive index, minor narrowing of the optical bandgap, and an increase in the hardness of the films deposited on c-sapphire at T<sub>G</sub> ≥ 400 °C. These properties, together with high catalytic efficiency of mixed TiO<sub>2</sub>-II and anatase phases, as reported earlier, make the films promising for application in various functional coatings.
format	article
author	Kristel Möls Lauri Aarik Hugo Mändar Aarne Kasikov Taivo Jõgiaas Aivar Tarre Jaan Aarik
author_facet	Kristel Möls Lauri Aarik Hugo Mändar Aarne Kasikov Taivo Jõgiaas Aivar Tarre Jaan Aarik
author_sort	Kristel Möls
title	Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases
title_short	Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases
title_full	Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases
title_fullStr	Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases
title_full_unstemmed	Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases
title_sort	influence of α-al<sub>2</sub>o<sub>3</sub> template and process parameters on atomic layer deposition and properties of thin films containing high-density tio<sub>2</sub> phases
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/254cd2b1dc7e4b5188ee6668084d8a4b
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Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases

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