Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases

Influence of α-Al<sub>2</sub>O<sub>3</sub> Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO<sub>2</sub> Phases

High-density phases of TiO<sub>2</sub>, such as rutile and high-pressure TiO<sub>2</sub>-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO<sub>2</sub>-II with anatase and rutile have been...

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Autores principales: Kristel Möls, Lauri Aarik, Hugo Mändar, Aarne Kasikov, Taivo Jõgiaas, Aivar Tarre, Jaan Aarik
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
titanium dioxide
thin films
atomic layer deposition
anatase
rutile
TiO<sub>2</sub>-II
Engineering (General). Civil engineering (General)
TA1-2040
Acceso en línea:https://doaj.org/article/254cd2b1dc7e4b5188ee6668084d8a4b
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