Modeling of structure of deposit formed by laser-induced deposition of metals from gas phase
The mathematical model that describes adequate the laser-induced process of metal deposition from gas phase on dielectric substrate is suggested. In the result of calculation, the temperature field distribution in deposited materials and deposit profiles for different process stages are obtained...
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Autores principales: | , , |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2008
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Materias: | |
Acceso en línea: | https://doaj.org/article/2fed444c4db648618021be4ec8b8d449 |
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Sumario: | The mathematical model that describes adequate the laser-induced process of metal
deposition from gas phase on dielectric substrate is suggested. In the result of calculation, the
temperature field distribution in deposited materials and deposit profiles for different process
stages are obtained. The material deposition rate in the moment of deposited particle contacting with free surface is calculated. The explanation of mechanism of formation of irregular
form deposits at the initial stage of deposition is proposed.
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