Lithography for robust and editable atomic-scale silicon devices and memories
Manipulation at the atomic scale comes with a trade-off between simplicity and thermal stability. Here, Achal et al. demonstrate improved automated hydrogen lithography and repassivation, enabling error-corrected atomic writing of large-scale structures/memories that are stable at room temperature.
Enregistré dans:
| Auteurs principaux: | , , , , , , , , |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2018
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/378d1b6861c14c8dabd6194509e47d6d |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|