Lithography for robust and editable atomic-scale silicon devices and memories

Manipulation at the atomic scale comes with a trade-off between simplicity and thermal stability. Here, Achal et al. demonstrate improved automated hydrogen lithography and repassivation, enabling error-corrected atomic writing of large-scale structures/memories that are stable at room temperature.

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Autores principales:	Roshan Achal, Mohammad Rashidi, Jeremiah Croshaw, David Churchill, Marco Taucer, Taleana Huff, Martin Cloutier, Jason Pitters, Robert A. Wolkow
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2018
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/378d1b6861c14c8dabd6194509e47d6d
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spelling	oai:doaj.org-article:378d1b6861c14c8dabd6194509e47d6d2021-12-02T17:33:06ZLithography for robust and editable atomic-scale silicon devices and memories10.1038/s41467-018-05171-y2041-1723https://doaj.org/article/378d1b6861c14c8dabd6194509e47d6d2018-07-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-05171-yhttps://doaj.org/toc/2041-1723Manipulation at the atomic scale comes with a trade-off between simplicity and thermal stability. Here, Achal et al. demonstrate improved automated hydrogen lithography and repassivation, enabling error-corrected atomic writing of large-scale structures/memories that are stable at room temperature.Roshan AchalMohammad RashidiJeremiah CroshawDavid ChurchillMarco TaucerTaleana HuffMartin CloutierJason PittersRobert A. WolkowNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-8 (2018)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Roshan Achal Mohammad Rashidi Jeremiah Croshaw David Churchill Marco Taucer Taleana Huff Martin Cloutier Jason Pitters Robert A. Wolkow Lithography for robust and editable atomic-scale silicon devices and memories
description	Manipulation at the atomic scale comes with a trade-off between simplicity and thermal stability. Here, Achal et al. demonstrate improved automated hydrogen lithography and repassivation, enabling error-corrected atomic writing of large-scale structures/memories that are stable at room temperature.
format	article
author	Roshan Achal Mohammad Rashidi Jeremiah Croshaw David Churchill Marco Taucer Taleana Huff Martin Cloutier Jason Pitters Robert A. Wolkow
author_facet	Roshan Achal Mohammad Rashidi Jeremiah Croshaw David Churchill Marco Taucer Taleana Huff Martin Cloutier Jason Pitters Robert A. Wolkow
author_sort	Roshan Achal
title	Lithography for robust and editable atomic-scale silicon devices and memories
title_short	Lithography for robust and editable atomic-scale silicon devices and memories
title_full	Lithography for robust and editable atomic-scale silicon devices and memories
title_fullStr	Lithography for robust and editable atomic-scale silicon devices and memories
title_full_unstemmed	Lithography for robust and editable atomic-scale silicon devices and memories
title_sort	lithography for robust and editable atomic-scale silicon devices and memories
publisher	Nature Portfolio
publishDate	2018
url	https://doaj.org/article/378d1b6861c14c8dabd6194509e47d6d
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Lithography for robust and editable atomic-scale silicon devices and memories

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