Large area growth of few-layer In2Te3 films by chemical vapor deposition and its magnetoresistance properties
Abstract In this work we report a facile route to grow large area, uniform, continuous and few-layer α-In2Te3 film via chemical vapor deposition (CVD) methods. The characterizations show the large area of CVD-grown few-layer α-In2Te3. This method guarantees the precise control of thickness down to f...
Enregistré dans:
| Auteurs principaux: | , , , , , |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2019
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/39a6b410efc543d09f8a027e80bfc778 |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|