Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Advances in femtosecond laser-material interaction facilitate the extension of maskless optical processing to the high efficiency and deep-subwavelength scale. Here, a hybrid plasmon lithography technique has been demonstrated by irradiating near-infrared femtosecond laser pulses onto the Si materia...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Xie Hongbo, Zhao Bo, Cheng Jinluo, Chamoli Sandeep Kumar, Zou Tingting, Xin Wei, Yang Jianjun
Formato: article
Lenguaje:EN
Publicado: De Gruyter 2021
Materias:
Acceso en línea:https://doaj.org/article/3a6b760c2978449581ea531d252ab85d
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!