Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Advances in femtosecond laser-material interaction facilitate the extension of maskless optical processing to the high efficiency and deep-subwavelength scale. Here, a hybrid plasmon lithography technique has been demonstrated by irradiating near-infrared femtosecond laser pulses onto the Si materia...

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Autores principales:	Xie Hongbo, Zhao Bo, Cheng Jinluo, Chamoli Sandeep Kumar, Zou Tingting, Xin Wei, Yang Jianjun
Formato:	article
Lenguaje:	EN
Publicado:	De Gruyter 2021
Materias:	deep-subwavelength si nanograting dual-interface coupled plasmons femtosecond laser processing omnidirectional antireflection super-regular lithography Physics QC1-999
Acceso en línea:	https://doaj.org/article/3a6b760c2978449581ea531d252ab85d
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id	oai:doaj.org-article:3a6b760c2978449581ea531d252ab85d
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spelling	oai:doaj.org-article:3a6b760c2978449581ea531d252ab85d2021-12-05T14:10:56ZSuper-regular femtosecond laser nanolithography based on dual-interface plasmons coupling2192-861410.1515/nanoph-2021-0329https://doaj.org/article/3a6b760c2978449581ea531d252ab85d2021-09-01T00:00:00Zhttps://doi.org/10.1515/nanoph-2021-0329https://doaj.org/toc/2192-8614Advances in femtosecond laser-material interaction facilitate the extension of maskless optical processing to the high efficiency and deep-subwavelength scale. Here, a hybrid plasmon lithography technique has been demonstrated by irradiating near-infrared femtosecond laser pulses onto the Si material coated with thin Cr films in a vacuum chamber, and superior nanograting structures are found to deeply penetrate through the thin Cr film into the underlying Si substrate. In stark contrast to the common ripple structures formed on the Si surface, the Cr-layer mediated Si nanograting structures not only exhibit the spatially super-regular arrangements with a deep-subwavelength period of 355 nm but also present the nonsinusoidal sharp-edged groove geometry with a large depth-to-width aspect ratio of 2.1. Theoretical analyses and calculations reveal that the anomalous structure characterizations are physically ascribed to the excitation of dual-interface coupled plasmons in the thin metal layer, which possess the squeezed spatial wavelength and the periodic columnar intensity distributions. Moreover, the further deepening of periodic nanostructures into the Si substrate is also elucidated by the simulation of electric field enhancements at the bottom of shallow grooves under irradiation of subsequent laser pulses. In combination with a wet etching process, the Si nanograting structures can be modified into the smooth and narrow-mouthed V-profiles, whose optical measurements show a near omnidirectional antireflection especially in the visible range of 565–750 nm, which is expected for the design of advanced photonic devices.Xie HongboZhao BoCheng JinluoChamoli Sandeep KumarZou TingtingXin WeiYang JianjunDe Gruyterarticledeep-subwavelength si nanogratingdual-interface coupled plasmonsfemtosecond laser processingomnidirectional antireflectionsuper-regular lithographyPhysicsQC1-999ENNanophotonics, Vol 10, Iss 15, Pp 3831-3842 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	deep-subwavelength si nanograting dual-interface coupled plasmons femtosecond laser processing omnidirectional antireflection super-regular lithography Physics QC1-999
spellingShingle	deep-subwavelength si nanograting dual-interface coupled plasmons femtosecond laser processing omnidirectional antireflection super-regular lithography Physics QC1-999 Xie Hongbo Zhao Bo Cheng Jinluo Chamoli Sandeep Kumar Zou Tingting Xin Wei Yang Jianjun Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling
description	Advances in femtosecond laser-material interaction facilitate the extension of maskless optical processing to the high efficiency and deep-subwavelength scale. Here, a hybrid plasmon lithography technique has been demonstrated by irradiating near-infrared femtosecond laser pulses onto the Si material coated with thin Cr films in a vacuum chamber, and superior nanograting structures are found to deeply penetrate through the thin Cr film into the underlying Si substrate. In stark contrast to the common ripple structures formed on the Si surface, the Cr-layer mediated Si nanograting structures not only exhibit the spatially super-regular arrangements with a deep-subwavelength period of 355 nm but also present the nonsinusoidal sharp-edged groove geometry with a large depth-to-width aspect ratio of 2.1. Theoretical analyses and calculations reveal that the anomalous structure characterizations are physically ascribed to the excitation of dual-interface coupled plasmons in the thin metal layer, which possess the squeezed spatial wavelength and the periodic columnar intensity distributions. Moreover, the further deepening of periodic nanostructures into the Si substrate is also elucidated by the simulation of electric field enhancements at the bottom of shallow grooves under irradiation of subsequent laser pulses. In combination with a wet etching process, the Si nanograting structures can be modified into the smooth and narrow-mouthed V-profiles, whose optical measurements show a near omnidirectional antireflection especially in the visible range of 565–750 nm, which is expected for the design of advanced photonic devices.
format	article
author	Xie Hongbo Zhao Bo Cheng Jinluo Chamoli Sandeep Kumar Zou Tingting Xin Wei Yang Jianjun
author_facet	Xie Hongbo Zhao Bo Cheng Jinluo Chamoli Sandeep Kumar Zou Tingting Xin Wei Yang Jianjun
author_sort	Xie Hongbo
title	Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling
title_short	Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling
title_full	Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling
title_fullStr	Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling
title_full_unstemmed	Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling
title_sort	super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling
publisher	De Gruyter
publishDate	2021
url	https://doaj.org/article/3a6b760c2978449581ea531d252ab85d
work_keys_str_mv	AT xiehongbo superregularfemtosecondlasernanolithographybasedondualinterfaceplasmonscoupling AT zhaobo superregularfemtosecondlasernanolithographybasedondualinterfaceplasmonscoupling AT chengjinluo superregularfemtosecondlasernanolithographybasedondualinterfaceplasmonscoupling AT chamolisandeepkumar superregularfemtosecondlasernanolithographybasedondualinterfaceplasmonscoupling AT zoutingting superregularfemtosecondlasernanolithographybasedondualinterfaceplasmonscoupling AT xinwei superregularfemtosecondlasernanolithographybasedondualinterfaceplasmonscoupling AT yangjianjun superregularfemtosecondlasernanolithographybasedondualinterfaceplasmonscoupling
_version_	1718371597287424000

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

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