Effects of temperature conditions on fracture toughness of single crystal silicon wafer

This paper provides effects of furnace temperature conditions on the fracture toughness value of cleavage plane {110} on a single crystal silicon wafer. The fracture toughness KIC was measured using the controlled surface flaw (CSF) method under an assumption to develop a thin crack introduced by a...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Yudai SHIROKI, Kazuki IIDA, Satoshi SUTO, Masayoshi TATENO
Formato: article
Lenguaje:EN
Publicado: The Japan Society of Mechanical Engineers 2019
Materias:
Acceso en línea:https://doaj.org/article/3a8dbfd35df649228ebfa1e73d67c99d
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Ejemplares similares