Abnormal Positive Bias Temperature Instability Induced by Dipole Doped N-Type MOSCAP
This work performs fundamental electrical measurements and a positive bias temperature instability (PBTI) test on an N-type metal oxide semiconductor capacitor (MOSCAP) and a La<sub>2</sub>O<sub>3</sub> dipole-doped N-type MOSCAP. Experimental results show that the dipole-dop...
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Autores principales: | Fu-Yuan Jin, Ting-Chang Chang, Chien-Yu Lin, Jih-Chien Liao, Fong-Min Ciou, Yu-Shan Lin, Wei-Chun Hung, Kai-Chun Chang, Yun-Hsuan Lin, Yen-Cheng Chang, Ting-Tzu Kuo |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
IEEE
2019
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Materias: | |
Acceso en línea: | https://doaj.org/article/4047e49c404149afa37bbd7316f0ca15 |
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