Nanomechanical parameters of new carbazolyle-containing photoresist polymers

The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate...

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Autor principal: Palistrant, Natalia
Formato: article
Lenguaje:EN
Publicado: D.Ghitu Institute of Electronic Engineering and Nanotechnologies 2005
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Acceso en línea:https://doaj.org/article/406632edf5c54e3fa22d67c73a67e00e
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