Nanomechanical parameters of new carbazolyle-containing photoresist polymers
The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate...
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2005
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/406632edf5c54e3fa22d67c73a67e00e |
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| Sumario: | The new photopolymer layers from carbazolemethacrylates (CAM) with
oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and
investigated by us. Load and depth sensing indentation with a Berkovich indenter were
performed in order to evaluate the nanomechanical parameters of polymer films. The
reliability of the chosen analytical method was checked using number of repeats. The
influence of chemical composition, action of UF-light and aging on the nanomechanical
properties of CAM: OMA and PEPC were investigated. |
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